Semiconductor device

ABSTRACT

A semiconductor device includes: a first semiconductor layer including Al X Ga 1-X N (0≦X≦1); a second semiconductor layer provided on the first semiconductor layer, including Al Y Ga 1-Y N (0≦Y≦1, X&lt;Y), and having a larger bandgap than the first semiconductor layer; a source electrode provided on the second semiconductor layer; a drain electrode provided on the second semiconductor layer; and a gate electrode provided on the second semiconductor layer between the source electrode and the drain electrode. A region of the second semiconductor layer below the gate electrode at a depth short of the first semiconductor layer is doped with atoms to be negatively charged in the second semiconductor layer.

CROSS-REFERENCE TO RELATED APPLICATIONS

This application is a divisional of U.S. patent application Ser. No.12/371,216, filed Feb. 13, 2009 which is based upon and claims thebenefit of priority from the prior Japanese Patent Application No.2008-032187, milked on Feb. 13, 2008 and the prior Japanese PatentApplication No. 2008-327004, filed on Dec. 24, 2008; the entire contentsof which are incorporated herein by reference.

BACKGROUND OF THE INVENTION

1. Field of the Invention

This invention relates to a semiconductor device, and more particularlyto a semiconductor device based on a heterojunction structure of nitridesemiconductors.

2. Background Art

Circuits like switching power supplies and inverters are based on powersemiconductor devices such as switching devices and diodes, and thepower semiconductor devices are required to have high breakdown voltageand low on-resistance. Between the breakdown voltage and theon-resistance, there is a tradeoff depending on the device material. Byusing nitride semiconductors such as GaN and AlGaN or wide bandgapsemiconductors such as silicon carbide (SiC) as a device material, thetradeoff depending on the material can be improved relative to siliconto achieve low on-resistance and high breakdown voltage.

Devices based on nitride semiconductors such as GaN and AlGaN have goodmaterial characteristics, and hence high-performance power semiconductordevices can be realized. In particular, a HEMT (high electron mobilitytransistor) having an AlGaN/GaN heterostructure can realize lowon-resistance because a high-concentration two-dimensional electron gasis generated by polarization at the interface between the AlGaN layerand the GaN layer.

However, in the HEMT, the generation of a high-concentrationtwo-dimensional electron gas without impurity doping contrarily makes itdifficult to realize a normally-off transistor. To achieve normally-offcharacteristics while maintaining low on-resistance, the two-dimensionalelectron gas concentration below the gate electrode needs to beselectively decreased.

To this end, for example, a recess gate structure is known (e.g.,JP-A-2006-032650 (Kokai)), in which the AlGaN layer immediately belowthe gate electrode is etched to decrease the two-dimensional electrongas concentration only in the portion immediately below the gateelectrode.

This recess etching is performed by dry etching such as reactive ionetching because AlGaN and GaN are chemically stable materials anddifficult to wet etch. Here, the etching depth needs high accuracy incontrol and uniformity because the etching depth dictates thetwo-dimensional electron gas concentration. Furthermore, damage causedby dry etching is not negligible, which also causes concern aboutproblems such as increased leakage current.

In a rectifying device (diode) based on nitride semiconductors, lowon-resistance is compatible with high breakdown voltage. However, it isknown that its leakage current at reverse bias is larger by severalorders of magnitude than theoretically expected, which is a majorproblem for practical application.

SUMMARY OF THE INVENTION

According to an aspect of the invention, there is provided asemiconductor device including: a first semiconductor layer includingAl_(X)Ga_(1-X)N (0≦X≦1); a second semiconductor layer provided on thefirst semiconductor layer, including Al_(Y)Ga_(1-Y)N (0≦Y≦1, X<Y), andhaving a larger bandgap than the first semiconductor layer; a sourceelectrode provided on the second semiconductor layer; a drain electrodeprovided on the second semiconductor layer; and a gate electrodeprovided on the second semiconductor layer between the source electrodeand the drain electrode, a region of the second semiconductor layerbelow the gate electrode at a depth short of the first semiconductorlayer being doped with atoms to be negatively charged in the secondsemiconductor layer.

According to another aspect of the invention, there is provided asemiconductor device including: a first semiconductor layer includingAl_(X)Ga_(1-X)N (0≦X≦1); a second semiconductor layer provided on thefirst semiconductor layer, including Al_(Y)Ga_(1-Y)N (0≦Y≦1, X<Y), andhaving a larger bandgap than the first semiconductor layer; an anodeelectrode provided on the second semiconductor layer; and a cathodeelectrode provided on the second semiconductor layer, a region of thesecond semiconductor layer below the anode electrode at a depth short ofthe first semiconductor layer being doped with chlorine atoms.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a schematic view showing a cross section of the relevant partof a semiconductor device according to a first embodiment of theinvention;

FIG. 2 is a schematic view showing the depthwise distribution from thefrontside of the second semiconductor layer of halogen atoms implantedinto the second semiconductor layer in the first embodiment;

FIG. 3 shows gate voltage (Vg) versus drain current (Id)characteristics, comparing between a normal HEMT having an AlGaN/GaNheterostructure (Normal structure) and the same HEMT except thatchlorine atoms are ion implanted into the AlGaN layer below the gateelectrode (Cl implanted structure);

FIG. 4 shows the relationship between the dose amount of chlorine atomsinto the AlGaN layer (horizontal axis) and the threshold Vth of the gatevoltage (vertical axis) in the HEMT having an AlGaN/GaN heterostructure;

FIG. 5 is a schematic view showing a cross section of the relevant partof a semiconductor device according to a second embodiment of theinvention;

FIG. 6 is a schematic view showing a cross section of the relevant partof a semiconductor device according to a third embodiment of theinvention;

FIG. 7 is a schematic view showing a cross section of the relevant partof a semiconductor device according to a fourth embodiment of theinvention;

FIG. 8 is a schematic view showing the depthwise distribution from thefrontside of the second semiconductor layer of chlorine atoms implantedinto the second semiconductor layer in the fourth embodiment;

FIG. 9 shows voltage versus current characteristics, comparing betweenthe case where chlorine atoms are implanted into the AlGaN layer belowthe anode electrode and the case without implantation; and

FIG. 10 is a schematic view showing a cross section of the relevant partof a semiconductor device according to a fifth embodiment of theinvention.

DETAILED DESCRIPTION OF THE INVENTION First Embodiment

FIG. 1 is a schematic view showing a cross section of the relevant partof a semiconductor device according to an embodiment of the invention.This embodiment is described with a GaN-based HEMT (high electronmobility transistor) taken as an example of the semiconductor device.

The semiconductor device according to this embodiment includes aheterojunction structure of a first semiconductor layer (channel layer)3 provided via a buffer layer 2 on a support substrate 1, and a secondsemiconductor layer (barrier layer) 4 having a larger bandgap than thefirst semiconductor layer 3. The buffer layer 2, the first semiconductorlayer 3, and the second semiconductor layer 4 are epitaxially grown inthis order on the support substrate 1.

The first semiconductor layer 3 includes undoped Al_(X)Ga_(1-X)N(0≦X≦1), which is not intentionally doped and does not substantiallycontain impurities, and the second semiconductor layer 4 includesundoped or n-type Al_(Y)Ga_(1-Y)N (0≦Y≦1, X<Y). In this embodiment, forexample, the first semiconductor layer 3 is an undoped GaN layer, andthe second semiconductor layer 4 is an undoped or n-type AlGaN layer.

The support substrate 1 and the buffer layer 2 are made of materialssuitable for epitaxial growth of GaN-based materials. The supportsubstrate 1 can be illustratively made of sapphire, SiC, Si, or GaN. Thebuffer layer 2 can be illustratively made of AlN or AlGaN.

A source electrode 5 and a drain electrode 6 are spaced from each otheron the surface of the second semiconductor layer 4. The source electrode5 and the drain electrode 6 are each in ohmic contact with the surfaceof the second semiconductor layer 4. A gate electrode 7 is provided onthe second semiconductor layer 4 between the source electrode 5 and thedrain electrode 6. The gate electrode 7 is in Schottky contact with thesurface of the second semiconductor layer 4.

In the heterojunction structure with the first semiconductor layer 3illustratively made of GaN and the second semiconductor layer 4illustratively made of AlGaN, AlGaN has a smaller lattice constant thanGaN. Hence, a strain occurs in the AlGaN layer, and the piezoelectriceffect causes piezoelectric polarization in the AlGaN layer. Thus, atwo-dimensional electron gas 9 is formed in the GaN layer near theinterface with the AlGaN layer. By controlling the gate voltage appliedto the gate electrode 7, the two-dimensional electron gas concentrationbelow the gate electrode 7 is varied, and the main current flowingbetween the source electrode 5 and the drain electrode 6 can becontrolled.

In particular, a semiconductor device used for power control is desiredto have normally-off characteristics, in which no substantial leakagecurrent flows between the drain electrode and the source electrode at agate voltage of zero volts. When the two-dimensional electron gasconcentration is decreased, the gate threshold voltage is shifted to theplus side, realizing normally-off characteristics. However, the decreasein the concentration of the overall two-dimensional electron gas resultsin increased on-resistance. To achieve normally-off characteristicswhile maintaining low on-resistance, the two-dimensional electron gasconcentration below the gate electrode needs to be selectivelydecreased.

To this end, in this embodiment, a region of the second semiconductorlayer 4 below the gate electrode 7 to a depth short of the firstsemiconductor layer 3 is doped with atoms to be negatively charged inthe second semiconductor layer 4. The region doped with these atoms isshown as a doped region 8 in FIG. 1. The dopant atoms are implanted intothe second semiconductor layer 4 illustratively by ion implantation.

The dopant atom has a property of being negatively charged in the secondsemiconductor layer 4 including Al_(Y)Ga_(1-Y)N (0≦Y≦1, X<Y), and canillustratively be a halogen atom.

The aforementioned dopant atom serves as a negative fixed charge in thesecond semiconductor layer 4 below the gate electrode 7, and preventsthe generation or reduces the concentration of the two-dimensionalelectron gas below the gate electrode 7. That is, by the amount ofnegative fixed charge below the gate electrode 7, the gate threshold forpassing a drain current is shifted to the plus side, achievingnormally-off operation.

The aforementioned dopant atom is arbitrary as long as it is negativelycharged in the second semiconductor layer 4 including Al_(Y)Ga_(1-Y)N(0≦Y≦1, X<Y) (e.g., AlGaN layer). However, in particular, a halogen atomhaving high electronegativity easily becomes an anion when implantedinto the second semiconductor layer 4, and a high threshold shift effectcan be expected. Among others, fluorine (electronegativity 3.98) andchlorine (electronegativity 3.16) have particularly highelectronegativity, and hence a higher threshold shift effect can beexpected.

If the atoms implanted from the frontside of the second semiconductorlayer 4 reach the first semiconductor layer 3 and deeply penetrate intothe position of the channel (two-dimensional electron gas 9), theimplanted atoms interfere with the motion of electrons and decrease themobility of the two-dimensional electron gas. This causescharacteristics degradation such as increased on-resistance. Hence, ionimplantation needs to be performed on the condition that the implantedatoms are confined in the second semiconductor layer 4 and do not reachthe depth of the two-dimensional electron gas 9.

The graph in FIG. 2 shows an example of the depthwise concentrationdistribution of atoms (e.g., halogen atoms) implanted from the frontsideof the second semiconductor layer 4 in this embodiment. In the graph,the horizontal axis represents the depth from the frontside of thesecond semiconductor layer 4, and the vertical axis represents theconcentration of implanted halogen atoms. FIG. 2 also shows the positionof the second semiconductor layer 4, the first semiconductor layer 3,and the two-dimensional electron gas 9 corresponding to the horizontalaxis of the graph.

For example, by controlling the acceleration voltage of atoms during ionimplantation, the distribution of implanted atoms can be confined in thesecond semiconductor layer 4. Thus, normally-off operation can beachieved without degrading characteristics for a transistor.

Halogen atoms are introduced into the second semiconductor layer 4 byion implantation. Hence, the concentration distribution thereof in thesecond semiconductor layer 4 has a peak at the implantation position andis sloped therearound along the thickness. In the example shown in FIG.2, the concentration peak (implantation position) of halogen atoms inthe second semiconductor layer 4 is located nearer to the frontside ofthe second semiconductor layer 4 than the interface with the firstsemiconductor layer 3. The concentration gradually decreases from thepeak position toward the frontside and the first semiconductor layer 3side.

The fluorine atom is lighter than the chlorine atom, and hence itsimplantation position is relatively difficult to control to a shallowdepth so as not to reach the first semiconductor layer 3. In contrast,the chlorine atom is nearly twice as heavy as the fluorine atom, andhence has good controllability in ion implantation to a shallow depth soas to be confined in the second semiconductor layer 4.

After ion implantation, heat treatment (typically above 400° C. forfluorine and chlorine) is needed to activate implanted atoms and recoverfrom damage during ion implantation. In this embodiment, heat treatmentat 500° C., for example, is performed after ion implantation.

FIG. 3 shows gate voltage (Vg) versus drain current (Id)characteristics, comparing between a HEMT having an AlGaN/GaNheterostructure with a gate length of 20 μm (Normal structure) and thesame HEMT except that chlorine atoms are ion implanted into the AlGaNlayer below the gate electrode to a depth short of the GaN layer andheat treated at 500° C. (Cl implanted structure).

In the Cl implanted structure, the amount of implanted chlorine atoms isinsufficient and results in a small amount of shift to the plus side inthe gate voltage threshold. Thus, normally-off operation, in which thedrain current Id is to vanish at a gate voltage of zero volts, is notachieved. However, it is seen that by using the structure according tothis embodiment, threshold shift of the gate voltage to the plus side isrealized in contrast to the Normal structure.

FIG. 4 shows the relationship between the dose amount of chlorine atomsinto the AlGaN layer (horizontal axis) and the threshold Vth of the gatevoltage (vertical axis). In the figure, the point indicated by a diamondrepresents the measured threshold of the device in which chlorine atomsare actually implanted into the AlGaN layer, and the solid linerepresents the calculated value assuming that the chlorine atomimplanted into the AlGaN layer acts as a monovalent anion.

From the result of FIG. 4, the measurement is in relatively goodagreement with the calculation, and it is seen that the threshold of thegate voltage can be controlled by controlling the dose amount of atomsto serve as negative fixed charges in the second semiconductor layer 4.

Here, it is also contemplated to use a mask to selectively apply plasmatreatment with a CF-based gas to the surface of the AlGaN layer belowthe gate electrode. Thus, the AlGaN layer below the gate electrode maybe doped with fluorine atoms to be negatively charged in the AlGaNlayer. The effect of such negative fixed charges may decrease thetwo-dimensional electron gas concentration only in the portion below thegate electrode to realize a normally-off structure.

However, plasma treatment may cause poor reproducibility due to theso-called loading effect, in which the plasma density varies with theopening area and pattern of the mask and the number of wafers. Thiscauses concern about problems in terms of productivity.

In contrast, according to this embodiment, selective introduction ofimpurities for normally-off operation can be realized by a methodestablished in the silicon semiconductor process, that is, combinationof ion implantation and heat treatment. Hence, a normally-off nitridesemiconductor device with good uniformity and reproducibility can bemanufactured.

If magnesium (Mg), for example, is ion implanted as an atom to benegatively charged in the AlGaN layer, a temperature above 1000° C. isneeded for activation heat treatment after ion implantation. Here, thereis concern that this heat treatment may deteriorate the crystallinity ofthe epitaxial growth layer, for example, and degrade suchcharacteristics as sheet resistance. Furthermore, the activation ratioof Mg is as low as approximately 10%, which requires implantation athigh concentration. This increases ion implantation damage, and thecharacteristics degradation resulting therefrom also causes concern.

In contrast, for fluorine and chlorine, the temperature for heattreatment after ion implantation can be as low as approximately 400 to500° C. This serves to avoid crystallinity deterioration and the likewhich may lead to characteristics degradation.

With regard to the region doped with atoms to be negatively charged inthe second semiconductor layer 4, at least the region immediately belowthe gate electrode 7 needs to be doped for normally-off operation.Furthermore, to control the two-dimensional electron gas concentrationfor other purposes, a region other than immediately below the gateelectrode 7 may be doped with atoms to be negatively charged in thesecond semiconductor layer 4.

Second Embodiment

In a second embodiment shown in FIG. 5, for example, a region near thegate electrode 7 in the second semiconductor layer 4 between the gateelectrode 7 and the drain electrode 6 is also selectively doped withatoms to be negatively charged in the second semiconductor layer 4, suchas aforementioned halogen atoms.

Thus, the two-dimensional electron gas concentration is reduced aroundthe end portion of the gate electrode 7 on the drain electrode 6 side toalleviate the electric field concentrating on the gate electrode edge.Hence, avalanche breakdown at this portion can be prevented to increasethe breakdown voltage.

Furthermore, to alleviate electric field concentration to furtherincrease the breakdown voltage, preferably, the two-dimensional electrongas concentration around the end portion of the gate electrode 7 on thedrain electrode 6 side has a concentration gradient that graduallyincreases from the gate electrode 7 side toward the drain electrode 6side. To this end, preferably, the dose amount of atoms added into thesecond semiconductor layer 4 thereabove to serve as negative fixedcharges is controlled to realize this concentration gradient.

Third Embodiment

Typically, the surface of AlGaN is often unstable. Hence, in the casewhere the second semiconductor layer 4 is made of AlGaN, a layer havingmore stable material or composition (e.g., undoped or n-type GaN layer)can be provided as a cap layer 11 on the second semiconductor layer 4 asshown in FIG. 6 to stabilize the device surface condition and reducevariations in characteristics.

Also in this structure, atoms to be negatively charged in the secondsemiconductor layer 4, such as aforementioned halogen atoms, can beimplanted from the frontside of the cap layer 11 below the gateelectrode 7 to a depth short of the first semiconductor layer 3 so thatthe negative fixed charges are confined in the second semiconductorlayer 4. Thus, normally-off operation can be achieved without degradingcharacteristics for a transistor. The negative fixed charge only needsnot to reach the first semiconductor layer 3 serving as a channel layerin which the two-dimensional electron gas 9 is formed, and causes noproblem even if it is located in the cap layer 11.

In the above embodiments, a GaN-based HEMT is taken as an example of thesemiconductor device based on nitride semiconductors. The followingembodiments are described with a rectifying device (diode) taken as anexample.

In a diode based on nitride semiconductors, low on-resistance iscompatible with high breakdown voltage. However, it is known that itsleakage current at reverse bias is larger by several orders of magnitudethan theoretically expected, which is a major problem for practicalapplication.

To solve this problem, there is a proposal of forming an anode electrodeby combination of electrodes having a high Schottky barrier and a lowSchottky barrier to achieve low on-resistance, low leakage current, andhigh breakdown voltage. Furthermore, there is another proposal ofintroducing fluorine below the anode electrode.

However, the configuration of an anode electrode based on two materialshaving different Schottky barriers has a problem of increasedmanufacturing cost.

In the method of fluorine doping below the anode electrode, because thefluorine atom is relatively light, fluorine is likely to penetratedeeply into the semiconductor layer. This causes concern that thefluorine atoms reach the two-dimensional electron gas and interfere withits migration, leading to increased ionic resistance. For this problem,penetration of fluorine atoms into a deep position can be reduced by ionimplantation at low acceleration voltage or plasma doping of fluorine.However, ion implantation at low acceleration voltage requires a specialapparatus different from a commonly-used ion implantation apparatus.Furthermore, plasma doping may cause poor reproducibility and otherproblems due to the so-called loading effect, in which the plasmadensity varies with wafer size, pattern density, and the number ofprocessed wafers. Hence, the above methods have trouble with cost andproductivity.

Thus, in the following embodiments, chlorine atoms are introduced intothe barrier layer below the anode electrode by ion implantation.

Fourth Embodiment

FIG. 7 is a schematic view showing a cross section of the relevant partof a semiconductor device according to a fourth embodiment of theinvention.

The semiconductor device according to this embodiment includes aheterojunction structure of a first semiconductor layer (channel layer)3 provided via a buffer layer 2 on a support substrate 1, and a secondsemiconductor layer (barrier layer) 4 having a larger bandgap than thefirst semiconductor layer 3. The buffer layer 2, the first semiconductorlayer 3, and the second semiconductor layer 4 are epitaxially grown inthis order on the support substrate 1.

The first semiconductor layer 3 includes undoped Al_(X)Ga_(1-X)N(0≦X≦1), and the second semiconductor layer 4 includes undoped or n-typeAl_(Y)Ga_(1-Y)N (0≦Y≦1, X<Y). In this embodiment, for example, the firstsemiconductor layer 3 is an undoped GaN layer, and the secondsemiconductor layer 4 is an undoped or n-type AlGaN layer.

The support substrate 1 and the buffer layer 2 are made of materialssuitable for epitaxial growth of GaN-based materials. The supportsubstrate 1 can be illustratively made of sapphire, SiC, Si, or GaN. Thebuffer layer 2 can be illustratively made of AlN or AlGaN.

An anode electrode 21 and a cathode electrode 22 are spaced from eachother on the surface of the second semiconductor layer 4. The cathodeelectrode 22 is formed in a pattern surrounding the anode electrode 21on the surface of the second semiconductor layer 4. The anode electrode21 is in Schottky contact with the surface of the second semiconductorlayer 4. The cathode electrode 22 is in ohmic contact with the surfaceof the second semiconductor layer 4.

In the heterojunction structure with the first semiconductor layer 3illustratively made of GaN and the second semiconductor layer 4illustratively made of AlGaN, AlGaN has a smaller lattice constant thanGaN. Hence, a strain occurs in the AlGaN layer, and the piezoelectriceffect causes piezoelectric polarization in the AlGaN layer. Thus, atwo-dimensional electron gas 9 is formed in the GaN layer near theinterface with the AlGaN layer.

During application of forward voltage in which the anode electrode 21 isplaced at a higher potential than the cathode electrode 22, a forwardcurrent flows between the anode electrode 21 and the cathode electrode22 through the two-dimensional electron gas 9.

In this embodiment, a region of the second semiconductor layer 4 belowthe anode electrode 21 to a depth short of the first semiconductor layer3 is doped with chlorine atoms. The region doped with chlorine atoms isshown as a chlorine-doped region 20 in FIG. 7. The dopant atoms areimplanted into the second semiconductor layer 4 by ion implantation anddiffused into the second semiconductor layer 4 by heat treatment.

The aforementioned chlorine atom serves as a negative fixed charge inthe second semiconductor layer 4 below the anode electrode 21, andreduces the two-dimensional electron gas concentration below the anodeelectrode 21. This can reduce reverse current (leakage current) duringapplication of reverse voltage in which the anode electrode 21 is placedat a lower potential than the cathode electrode 22. Chlorine hasrelatively high electronegativity, and easily becomes an anion whenimplanted into the second semiconductor layer 4. Thus, a significanteffect of reducing leakage current is achieved.

If the chlorine atoms implanted from the frontside of the secondsemiconductor layer 4 reach the first semiconductor layer 3 and deeplypenetrate into the position of the channel (two-dimensional electron gas9), the implanted chlorine atoms interfere with the motion of electronsand decrease the mobility of the two-dimensional electron gas. Thiscauses characteristics degradation such as increased on-resistance.Hence, ion implantation needs to be performed on the condition that theimplanted atoms is confined in the second semiconductor layer 4 and donot reach the depth of the two-dimensional electron gas 9.

The graph in FIG. 8 shows an example of the depthwise concentrationdistribution of chlorine atoms implanted from the frontside of thesecond semiconductor layer 4 in this embodiment. In the graph, thehorizontal axis represents the depth from the frontside of the secondsemiconductor layer 4, and the vertical axis represents theconcentration of implanted chlorine atoms. FIG. 8 also shows theposition of the second semiconductor layer 4, the first semiconductorlayer 3, and the two-dimensional electron gas 9 corresponding to thehorizontal axis of the graph.

The chlorine atom is nearly twice as heavy as the fluorine atom, forexample, and hence has good controllability in ion implantation to ashallow depth so as to be confined in the second semiconductor layer 4without reaching the two-dimensional electron gas 9.

Chlorine is introduced into the second semiconductor layer 4 by ionimplantation. Hence, the chlorine concentration distribution in thesecond semiconductor layer 4 has a peak at the implantation position andis sloped therearound along the thickness. In the example shown in FIG.8, the concentration peak (implantation position) of chlorine atoms inthe second semiconductor layer 4 is located nearer to the frontside ofthe second semiconductor layer 4 than the interface with the firstsemiconductor layer 3. The concentration gradually decreases from thepeak position toward the frontside and the first semiconductor layer 3side.

After ion implantation, heat treatment is performed to activateimplanted chlorine atoms and recover from damage during ionimplantation. For chlorine, the temperature for heat treatment after ionimplantation can be as low as approximately 400 to 500° C. This servesto avoid crystallinity deterioration and the like which may lead tocharacteristics degradation.

In FIG. 9, graph a (Cl implanted) shows an example of voltage-currentcharacteristics in the case where chlorine atoms are ion implanted intothe AlGaN layer below the anode electrode to a depth short of the GaNlayer and heat treated at 500° C. as described above. Graph b (normal)is an example of characteristics in the case without chlorineimplantation.

The result of FIG. 9 shows that chlorine implantation below the anodeelectrode achieves a lower reverse current (leakage current) than thecase without it.

As described above, this embodiment can reduce leakage current, whichcauses trouble in diodes based on nitride semiconductors. Hence, thisembodiment can provide a diode with low on-resistance, low leakagecurrent, and high breakdown voltage.

Furthermore, chlorine is introduced into the second semiconductor layer4 by a method established in the silicon semiconductor process, that is,combination of ion implantation and heat treatment. Hence, a diode withgood uniformity and reproducibility in characteristics can be provided.That is, there is no problem of the aforementioned loading effect inplasma doping. Furthermore, use of chlorine provides goodcontrollability in implantation depth. Chlorine does not reach thetwo-dimensional electron gas and interfere with electron migration.

Fifth Embodiment

FIG. 10 is a schematic view showing a cross section of the relevant partof a semiconductor device according to a fifth embodiment of theinvention.

In this embodiment, chlorine is introduced only around the end portionof the anode electrode 21 on the cathode electrode 22 side to form achlorine-doped region 20. Also in this embodiment, the chlorine-dopedregion 20 is confined in the second semiconductor layer 4 withoutreaching the first semiconductor layer 3.

Around the end portion of the anode electrode 21 on the cathodeelectrode 22 side, the electric field strength tends to increase, andleakage current is likely to occur particularly in that portion. Hence,a significant effect of reducing leakage current can be achieved byintroducing chlorine only in that portion to reduce the two-dimensionalelectron gas concentration, that is, to increase resistance.Furthermore, because the resistance of the portion below the anodeelectrode 21 between the chlorine-doped regions 20 is not increased, theon-resistance during forward bias can be reduced.

A dielectric film 25 serving as a protective film is provided on thesurface of the second semiconductor layer 4 between the anode electrode21 and the cathode electrode 22, and part of the anode electrode 21extends on the dielectric film 25 to the cathode electrode 22 side toserve as a field plate electrode 26. This prevents lines of electricforce from locally concentrating on the end portion of the anodeelectrode 21. Thus, avalanche breakdown at that portion is prevented toachieve high breakdown voltage.

The field plate electrode 26 is not limited to the structure integratedwith the anode electrode 21, but may be separately provided. In eithercase, the field plate electrode 26 only needs to be equipotential to theanode electrode 21.

The dielectric film 25 can be illustratively made of SiN, SiO₂, Al₂O₃,HfO₂, TaO_(x), TiO₂, or any combination of at least two of them (e.g., acombination of SiN and SiO₂).

Also in the fourth and fifth embodiment, like the third embodiment shownin FIG. 6, a layer having more stable material or composition (e.g.,undoped or n-type GaN layer) than AlGaN may be provided as a cap layeron the second semiconductor layer 4 to stabilize the device surfacecondition and reduce variations in characteristics.

The embodiments of the invention have been described with reference toexamples. However, the invention is not limited thereto, but can bevariously modified within the spirit of the invention.

In the above embodiments, the combination of the second semiconductorlayer (barrier layer) and the first semiconductor layer (channel layer)is illustrated by the combination of AlGaN/GaN. However, the inventionis also applicable to the combination of GaN/InGaN and the combinationof AlN/AlGaN.

The gate structure in the first to third embodiment is not limited tothe Schottky gate structure, but may be the MIS(metal-insulator-semiconductor) gate structure or the recess gatestructure. Furthermore, a structure including a field plate electrode onthe second semiconductor layer to increase the breakdown voltage, forexample, can also achieve the effects like those described above, andthe invention can be also practiced with this structure.

1. A semiconductor device comprising: a first semiconductor layerincluding AlXGa1-XN (0≦X≦1); a second semiconductor layer provided onthe first semiconductor layer, including AlYGa1-YN (0≦Y≦1, X<Y), andhaving a larger bandgap than the first semiconductor layer; an anodeelectrode provided on the second semiconductor layer; and a cathodeelectrode provided on the second semiconductor layer, a region of thesecond semiconductor layer below the anode electrode at a depth short ofthe first semiconductor layer being doped with chlorine atoms.
 2. Thesemiconductor device according to claim 1, wherein the region doped withthe chlorine atoms is provided only around an end portion of the anodeelectrode on the cathode electrode side.
 3. The semiconductor deviceaccording to claim 1, further comprising: a dielectric film provided onthe second semiconductor layer between the anode electrode and thecathode electrode; and a field plate electrode provided on thedielectric film and set to be equipotential to the anode electrode. 4.The semiconductor device according to claim 1, wherein the anodeelectrode is in Schottky contact with the second semiconductor layer,and the cathode electrode is in ohmic contact with the secondsemiconductor layer.
 5. The semiconductor device according to claim 1,wherein the first semiconductor layer is an undoped layer which is notsubstantially doped with impurities.
 6. The semiconductor deviceaccording to claim 1, wherein the chlorine atom is atoms are introducedinto the second semiconductor layer by ion implantation.
 7. Thesemiconductor device according to claim 1, wherein concentration of thechlorine atoms in the second semiconductor layer is sloped along filmthickness.
 8. The semiconductor device according to claim 1, wherein thechlorine atoms have a concentration peak in the second semiconductorlayer.
 9. The semiconductor device according to claim 8, wherein theconcentration peak of the chlorine atoms is located nearer to thesurface of the second semiconductor layer than to the interface betweenthe first semiconductor layer and the second semiconductor layer.